Study on the optical properties and hydrogen content of the silicon nitride thin film
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference13 articles.
1. Phase-Change Optical Disks with High Writing Sensitivity Using a-SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
2. Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
3. Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method
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