Dissipative light masks for atomic nanofabrication
Author:
Publisher
IOP Publishing
Subject
Physics and Astronomy (miscellaneous),Atomic and Molecular Physics, and Optics
Reference25 articles.
1. Using light as a lens for submicron, neutral-atom lithography
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Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dissipative light mask generated by a nonuniformly polarized field for atomic lithography;Journal of Experimental and Theoretical Physics;2007-06
2. Resource Letter AON-1: Atom optics, a tool for nanofabrication;American Journal of Physics;2007-05
3. Polarization-gradient laser cooling as a way to create strongly localized structures for atom lithography;Physical Review A;2007-02-28
4. Simulation of sodium atom deposition pattern in a laser standing wave field;Acta Physica Sinica;2006
5. Steady-state light-induced forces in atomic nanolithography;Journal of Experimental and Theoretical Physics;2005-10
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