An analytical solution for thermal transport in deep x-ray lithography
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Numerical simulation of thermal distortions in deep and ultra deep X-ray lithography
2. Surface roughness control by energy shift in deep X-ray lithography
3. Physical modeling and analysis of microlens formation fabricated by a modified LIGA process
4. A simple method for microlens fabrication by the modified LIGA process
5. Modelling of Microfabrication Systems
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1. A numerical procedure for estimation of the melt depth in laser material processing;Optics & Laser Technology;2009-04
2. An inverse problem of estimating the Biot number in deep X-ray lithography;Applied Physics B;2007-12-08
3. Modelling of simultaneous estimating the laser heat flux and melted depth during laser processing by inverse methodology;International Communications in Heat and Mass Transfer;2007-04
4. Simultaneously estimating the contact heat and mass transfer coefficients in a double-layer hollow cylinder with interface resistance;Applied Thermal Engineering;2007-02
5. An inverse problem in simultaneously estimating boundary moisture fluxes in a porous annular cylinder;Acta Mechanica;2005-09-08
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