The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping-Reference-Cited by-同舟云学术

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The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping

Published:2004-07-14 Issue:10 Volume:14 Page:1384-1389
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Shirtcliffe Neil J,Aqil Sanaa,Evans Carl,McHale Glen,Newton Michael I,Perry Carole C,Roach Paul

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. New formation technology for a plasma display panel barrier-rib structure using a precise metal mold fabricated by the UV-LIGA process

2. Monolithic coupling of a SU8 waveguide to a silicon photodiode

3. Micromachined SU8 negative resist for MMIC applications on low resistivity CMOS substrates

4. SU8-micromechanical structures with in situ fabricated movable parts

5. Movable vertical mirror arrays for optical microswitch matrixes and their electromagnetic actuation

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