Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation-Reference-Cited by-同舟云学术

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Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation

Published:2015-08-18 Issue:9 Volume:25 Page:095011
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Gosset N,Boufnichel M,Bahette E,Khalfaoui W,Ljazouli R,Grimal-Perrigouas V,Dussart R

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0960-1317/25/i=9/a=095011/pdf

Reference40 articles.

1. Handbook of Advanced Plasma Processing Techniques

2. Technology and applications of broad‐beam ion sources used in sputtering. Part I. Ion source technology

3. Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications

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