Tuning plasma parameters to control reactive species fluxes to substrates in the context of plasma catalysis

Author:

Jiang JingkaiORCID,Bruggeman Peter JORCID

Abstract

Abstract The key reactive plasma-produced gas phase species responsible for the enhanced conversion of chemicals in plasma catalysis compared to thermal catalysis have to date not been identified. This outstanding question is mainly due to the inherent large variety of plasma-produced species and the challenge of controlling and measuring the flux of each constituent of the cocktail of reactive species to a (catalytic) substrate. In this paper, we explore the possibility to control the dominant reactive species fluxes, relevant for plasma–catalysis, to a substrate in the effluent of an RF driven Ar–O2 plasma jet. The absolute species densities of the major reactive species (O, O2(a 1Δg), O3 and ions) were quantified by molecular beam mass spectrometry (MBMS) to assess the possibility of using treatment distance, O2 admixture concentration, plasma dissipated power, RF modulation frequency and duty cycle as well as the feed gas flow rate to alter the dominant species densities. Selected experimental results were also compared with a pseudo-1D plug flow model. The short-lived and long-lived species can be effectively separated by changing the treatment distance and the RF modulation frequency. Furthermore, adjusting the O2 admixture concentration enables to change the ratio of the O2(a 1Δg) and O3 density. The changes in the trend of ion and O flux were found to be very similar for nearly all investigated parameters. Nonetheless the gas flow rate was able to significantly change the ratio of the O and ion density in the plasma jet effluent. The impact of the surface-dependent loss probability and boundary layer reactions on the species flux to a substrate and how this qualitatively relates to the MBMS density measurements is further addressed.

Funder

US Department of Energy

National Science Foundation

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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