Optimization and integration of ultrathin e-beam grown HfO2 gate dielectrics in MoS2 transistors
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1088/1361-6463/ac19e0/pdf
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