Characteristic excitonic absorption of MoSi2N4 and WSi2N4 monolayers

Author:

Liu Hongling,Huang Baibiao,Dai YingORCID,Wei WeiORCID

Abstract

Abstract As new members of the two-dimensional materials family, MoSi2N4 and WSi2N4 exhibit unique physical properties. However, their optical properties in consideration of spin–orbit coupling (SOC) have not been discussed. In this work, the excited-state properties of MoSi2N4 and WSi2N4 monolayers are studied by means of many-body perturbation theory in combination with first-principles calculations. We find that the quasiparticle correction leads to a large band gap renormalization of more than 1 eV for MoSi2N4 and WSi2N4 monolayers. Because of the SOC, characteristic A and B excitons form with large binding energies of about 1 eV. The excitation energy difference of A and B excitons can be used to well address the spin–valley splitting. MoSi2N4 shows more abundant excitons (A′, B′ and C excitons), turning out to be a promising candidate to explore intra- and inter-exciton transitions. The exciton wave function indicates that the low-energy excitons in MoSi2N4 and WSi2N4 monolayers are confined in the middle MoN2/WN2 layer, which is unfavorable for excitonic photocatalysis. On the other hand, the valley states based on excitons can be protected by SiN layers from both sides.

Funder

Shandong Provincial Key Research and Development Program

National Natural Science Foundation of China

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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