Probing the electron density in HiPIMS plasmas by target inserts
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/1361-6463/aa9914/pdf
Reference30 articles.
1. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
2. An introduction to thin film processing using high-power impulse magnetron sputtering
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4. Anomalous cross-Bfield transport and spokes in HiPIMS plasma
5. Sputtering process in the presence of plasma self-organization
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