Polarization dependent multiphoton absorption in ZnO thin films

Author:

Hollinger RichardORCID,Gupta Dishiti,Zapf MaximilianORCID,Karst Maximilian,Röder RobertORCID,Uschmann Ingo,Reislöhner Udo,Kartashov Daniil,Ronning CarstenORCID,Spielmann ChristianORCID

Abstract

Abstract We present a simple non-destructive approach for studying the polarization dependence of nonlinear absorption processes in semiconductors. The method is based on measuring the yield of the near UV photoluminescence as a function of polarization and intensity of femtosecond laser pulses. In particular, we investigated the polarization dependence of three photon laser absorption in intrinsic and Al-doped ZnO thin films. Both specimen show stronger emission for linearly polarized excitation compared to circular polarization. The ratios for the three-photon absorption coefficients are about 1.8 and independent of the doping. It is shown that Al-doped films have lower threshold for stimulated emission in comparison to the intrinsic films.

Funder

Helmholtz Institute Jena

Deutsche Forschungsgemeinschaft

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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