Abstract
Abstract
High-performance germanium (Ge) lateral PIN photodetector (PD) arrays for short wave infrared (SWIR) imaging based on Ge-on-insulator (GOI) platform was proposed and demonstrated. The high-quality GOI platform with top-Ge layer thickness of 1.25 μm and threading dislocation density of less than 105 cm−2 was prepared by using bonding and smart-cut technology. P-type and N-type regions with centrosymmetric racetrack shapes were introduced to lower the sidewall electric field and suppress the surface leakage current of the PD. Benefiting from the high-quality of the GOI platform and the unique design of lateral active regions, a low dark current of 2 nA under −1 V with outstanding rectification ratio of 2.1 × 106 were obtained at room temperature. Through constructing a vertical resonant cavity by SiO2 passivation layer and the Si/SiO2 substrate, the responsivity at 1550 nm was enhanced to 0.46 A W−1 with a high specific detectivity of 3.09 × 1010cm·Hz1/2 ·W−1 under −1 V. Ultimately, SWIR imaging was demonstrated by a Ge lateral PIN PD line array with 1 × 8 pixels under zero bias at room temperature. The results indicate that the proposed lateral Ge PD structure holds great application potential in the field of SWIR imaging.
Funder
Zhejiang Xingxin Semiconductor Co., Ltd.
National Natural Science Foundation of China
Cited by
2 articles.
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