Dynamic reactions of defects in ion-implanted 4H-SiC upon high temperature annealing

Abstract

Abstract Single-photon emitters based on intrinsic defects in silicon carbide (SiC) are promising as solid-state qubits for the quantum information storage, whereas defect engineering in a controllable manner still remains challenging. Herein, the thermally-driven defect dynamic reaction in the ion implanted 4H-SiC has been exploited through the optical emission spectra of defects. For the heavy-ion (Si or Ar) implanted samples with abundant Frenkel pairs, the silicon vacancies (VSi) are energetically converted into the carbon antisite-vacancy pair (CSi-VC) upon annealing till 1300 °C for 30 min, accompanied with the gradual lattice recovery and local strain relaxation. The further temperature elevation dissociates the metastable CSi-VC into carbon antisite (CSi) and carbon vacancy (VC), as supported by the consequent quenching of the (CSi-VC)-related emission at 700 nm. Thus, the whole defect reaction is probed as the vacancy interconversion from VSi to VC with the byproduct of stacking faults. In contrast, the intermediate CSi-VC complexes are not energetically favorable during the annealing of the H-implanted sample, which results from the negligible generation of Frenkel pairs, as supported by the x-ray diffraction patterns and Raman scattering analysis. These findings provide guidance for defect engineering in SiC toward the creation of reliable single photon emitters.