Towards free-standing graphane: atomic hydrogen and deuterium bonding to nano-porous graphene

Author:

Abdelnabi Mahmoud Mohamed SaadORCID,Blundo ElenaORCID,Betti Maria GraziaORCID,Cavoto GianlucaORCID,Placidi ErnestoORCID,Polimeni AntonioORCID,Ruocco AlessandroORCID,Hu KailongORCID,Ito YoshikazuORCID,Mariani CarloORCID

Abstract

Abstract Graphane is formed by bonding hydrogen (and deuterium) atoms to carbon atoms in the graphene mesh, with modification from the pure planar sp2 bonding towards an sp3 configuration. Atomic hydrogen (H) and deuterium (D) bonding with C atoms in fully free-standing nano porous graphene (NPG) is achieved, by exploiting low-energy proton (or deuteron) non-destructive irradiation, with unprecedented minimal introduction of defects, as determined by Raman spectroscopy and by the C 1s core level lineshape analysis. Evidence of the H- (or D-) NPG bond formation is obtained by bringing to light the emergence of a H- (or D-) related sp3-distorted component in the C 1s core level, clear fingerprint of H–C (or D–C) covalent bonding. The H (or D) bonding with the C atoms of free-standing graphene reaches more than 1/4 (or 1/3) at% coverage. This non-destructive H-NPG (or D-NPG) chemisorption is very stable at high temperatures up to about 800 K, as monitored by Raman and x-ray photoelectron spectroscopy, with complete healing and restoring of clean graphene above 920 K. The excellent chemical and temperature stability of H- (and D-) NPG opens the way not only towards the formation of semiconducting graphane on large-scale samples, but also to stable graphene functionalisation enabling futuristic applications in advanced detectors for the β-spectrum analysis.

Funder

Sapienza Università di Roma

Instituto Nazionale di Fisica Nucleare

Ministero dell’Istruzione, dell’Università e della Ricerca

Japan Society for the Promotion of Science

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

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