Low-cost and simple fabrication of hierarchical Al nanopit arrays for deep ultraviolet refractive index sensing

Abstract

Abstract Herein, we proposed a simple non-lithographic way to fabricate hierarchical Al nanopit arrays performed as deep ultraviolet (DUV, 200–300 nm) refractive index sensing. Only by adjusting the Al deposition thickness on the Al nanopit array, the hierarchical Al nanopit arrays with tunable plasmonic properties in the DUV region were obtained. The prepared hierarchical Al nanopit arrays are of very good time stability and its RI sensitivity and concentration detection limit of adenine ethanol solution reach 311 nm/RIU and 5 × 10 − 6 M , respectively, as the Al deposition thickness is 60 nm. Furthermore, the electric field distribution simulation results show that high RI sensing characteristic are mainly attributed to the local surface plasmon resonance. This investigation provides a facile way to develop low cost, high efficient and easily fabricated Al-based RI sensor in the DUV region.