Direct writing of silicon nanostructures using liquid-phase electron beam induced deposition of hydrosilanes-Reference-Cited by-同舟云学术

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Direct writing of silicon nanostructures using liquid-phase electron beam induced deposition of hydrosilanes

Published:2021-02-15 Issue:19 Volume:32 Page:195301
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Masuda Takashi^ORCID,Mori Masahiro

Funder

The Sumitomo Foundation

JSPS KAKENHI

The Asahi Glass Foundation

Takahashi Industrial and Economic Research Foundation

Casio Science Promotion Foundation

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

https://iopscience.iop.org/article/10.1088/1361-6528/abe0e9/pdf

Reference34 articles.

1. Solution-processed silicon films and transistors;Shimoda;Nature,2006

2. Solution-processed polycrystalline silicon on paper;Trifunovic;Appl. Phys. Lett.,2015

3. Fabrication of solution-processed hydrogenated amorphous silicon single-junction solar cells;Masuda;Appl. Phys. Lett.,2012

4. Solution-based fabrication of polycrystalline Si thin-film transistors from recycled polysilanes;Sberna;ACS Sustain. Chem. Eng.,2017

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Polysilicon TFTs fabricated using poly-tetrasilane ink;MRS Communications;2022-01-20

2. Slot-die coating of silicon ink for volume production of CMOS polysilicon TFTs;Japanese Journal of Applied Physics;2021-09-13

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