Abstract
Abstract
We report the growth, structural characterization, and transport studies of Bi2Se3 thin film on single crystalline silicon (Si), Si/SiO2, quartz, and glass substrates by thermal evaporation method. Our results show that 300 °C is the optimum substrate temperature to obtain the c-axis (001) oriented Bi2Se3 films on all the substrates. The film grown on the Si substrate has the minimum crystalline disorder. The energy-dispersive x-ray spectroscopy results show that film on Si substrate is bismuth deficient, the film on Si/SiO2 substrate is selenium deficient, and the film on quartz substrate is near perfect stoichiometric providing a way to tune the electronic properties of Bi2Se3 films through substrate selection. The film grown on quartz shows the highest mobility (2.7 × 104 cm2 V-1s−1) which drops to 150 cm2 V-1s−1 for Si, 60 cm2 V-1s−1 for Si/SiO2, and 0.9 cm2 V-1s−1 for glass substrate. Carrier concentration is n-type for Bi2Se3 films on Si (∼1018 cm−3), quartz (∼1018 cm−3) and Si/SiO2 (∼1019 cm−3) substrate with a clear indication of frozen out effect around 50 K for Si/SiO2 and Si substrate. Longitudinal resistivity of Bi2Se3 film on Si/SiO2 substrate shows different behavior in three different temperature regions: temperature dependent resistivity region due to electron–phonon scattering, a nearly temperature independent resistivity region due to electron–phonon and electron–ion scattering, and a quantum coherent transport region.