Chemical bath deposited Nickel oxide thin film as electrode material for pseudocapacitors

Abstract

We have synthesized thin films of nickel oxide (NiO) on silver and glass substrates, at very low temperature of 60°C, by chemical bath deposition (CBD) method. The precursor used consists of nickel nitrate and aqueous ammonia. Structural characteristics were studied using x-ray diffraction (XRD) and morphological studies were done using scanning electron microscopy (SEM). Ultraviolet-visible (UV-Vis) spectroscopy was used for optical studies. To investigate electrochemical behaviour of thin film electrode materials, cyclic voltammetry (CV) measurements were conducted. For electrochemical studies the galvanostatic charge/discharge (GCD) tests were also conducted. The formation of face centred cubic NiO structure was confirmed using XRD. The scanning electron microscopy images show uniform distribution of worm-like porous morphology. CV measurements revealed the capacitive behaviour of the films.