Development of a Post-CMOS Compatible Nanoporous Thin Film layer Based on Al2O3-Reference-Cited by-同舟云学术

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Development of a Post-CMOS Compatible Nanoporous Thin Film layer Based on Al2O3

Published:2018-05 Issue: Volume:350 Page:012001
ISSN:1757-8981
Container-title:IOP Conference Series: Materials Science and Engineering
language:
Short-container-title:IOP Conf. Ser.: Mater. Sci. Eng.

Author:

Dogan Ö,Buschhausen A,Walk C,Mokwa W,Vogt H

Publisher

IOP Publishing

Subject

General Medicine

Link

http://stacks.iop.org/1757-899X/350/i=1/a=012001/pdf

Reference30 articles.

1. Synthesis of high porosity, monolithic alumina aerogels

2. Thermal Stability and Phase Transformations ofγ-/Amorphous-Al2O3Thin Films

3. Microporous Ceramic Membranes

4. Characterization of porous alumina membranes for efficient, real-time, flow through biosensing

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1. Resistive Switching in Platinum/Titanium Dioxide Schottky Diode;2019 27th Iranian Conference on Electrical Engineering (ICEE);2019-04

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