Determination of focal spot size of high-energy microfocal X-ray source based on HfO2-coated single-bounce ellipsoidal glass monocapillary X-ray condenser

Abstract

Abstract A method based on the single-bounce ellipsoidal monocapillary X-ray condenser (SEGMXC) was improved for determining the focal spot size of the high-energy microfocal X-ray source. HfO2 was selected as the high-density material (∼9.68g/cm3) and coated on the inner surface of the SEGMXC by the atomic layer deposition method. The focal spot size of a microfocal spot X-ray source was obtained as 33.14 ± 0.02 μm and the relative deviation of the effective size given by the manufacturer was 5.3%.