Author:
Hasan Saadallah F.,Al-Samarai Abdul-Majeed E,Obaid A. S.,Ramizy Asmiet
Abstract
Abstract
In this studied gold (Au) nanoparticles doped tungsten oxide (WO3) thin film was deposited on porous silicon (PS) substrate at the substrate temperature of 250°C by spray pyrolysis deposition method, with different Au doping concentration of (0, 1, 3, and 5%). The gold nanoparticles GNPs were prepared by using normal atmospheric air cold plasma. All films were annealed at 500°C for 1h. The X-ray diffraction peaks indicated that all films are polycrystalline with a hexagonal structure. The surface morphology was studied by AFM. The average grain size for pure thin film WO3 was about 61 nm, and it decreased to be about 43.2 nm with increases the doping ratios for the film deposited at 5% of Au. FESEM image all doped and undoped films showed homogenous pattern structure on the porous silicon. The thickness of films was obtained from the cross-section of the FESEM, which was 323±5 nm. A blue-shifted showed based on the photolumenses (PL) peak position calculated of WO3 as doping ratio increased, the bandgap for Au: WO3 films lies between (2.85 to 3.02) eV.
Cited by
3 articles.
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