Grounds and problem statement for software complex for photolithography optimization for minimization of losses in optical structures of photonic integrated circuits

Abstract

Abstract The losses in optical components are the key obstacle in development of photonic integrated circuits (PIC). This makes the developers to include additional signal gain elements into the optical scheme. One of the major and optimizable factors of signal loss is the sidewall roughness of the optical components. After analysis of factors causing the line-edge roughness (LER), we developed the basic model of the roughness emerging process during forming of photolithography nanostructures. We proposed an approach to optimize the photolithography process in order to minimize the optical losses in fabricated optical structures. The software complex on the basis of this approach is currently under development.