Process Analysis and Optimization on PECVD Amorphous Silicon on Glass Substrate-Reference-Cited by-同舟云学术

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Process Analysis and Optimization on PECVD Amorphous Silicon on Glass Substrate

Published:2006-04-01 Issue: Volume:34 Page:812-817
ISSN:1742-6588
Container-title:Journal of Physics: Conference Series
language:
Short-container-title:J. Phys.: Conf. Ser.

Author:

Ong Yan Ying,Chen Bang Tao,Tay Francis E H,Iliescu Ciprian

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

http://stacks.iop.org/1742-6596/34/i=1/a=134/pdf

Reference15 articles.

1. Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass

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1. Insights into the Si─H Bonding Configuration at the Amorphous/Crystalline Silicon Interface of Silicon Heterojunction Solar Cells by Raman and FTIR Spectroscopy;Advanced Materials;2023-10-16

2. A COMPREHENSIVE REVIEW ON THIN FILM DEPOSITIONS ON PECVD REACTORS;Annals of the Academy of Romanian Scientists Series on Science and Technology of Information;2021

3. Influence of PECVD Deposition Power and Pressure on Phosphorus-Doped Polysilicon Passivating Contacts;IEEE Journal of Photovoltaics;2020-09

4. Study of the methane flow influence in the micro-tribology behavior of DLC coatings deposited by PECVD: a Raman analysis;Carbon Letters;2020-05-06

5. Porous graphene current collectors filled with silicon as high-performance lithium battery anode;Materials Research Express;2018-01-04

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