Plasma-Profile Control in an ICP Reactor

Abstract

Abstract ICP is widely used in electromagnetic scattering due to its high electron density and simple structure. The distribution of plasma parameters can affect the electromagnetic scattering, so the control of plasma parameter distribution is very important for aircraft stealth. Firstly, the effect of the number of coil turns on the plasma parameter distribution is analyzed. With the increase of the number of coil turns, the peak value of induced magnetic field decrease, the width of magnetic field increase and the homogeneity of plasma increase. Then, the Boltzmann solver is used to calculate the plasma electron energy distribution function at different positions under the four-turn coil. Finally, the influence of external circuit capacitance on plasma parameter distribution is analyzed. In this cavity structure, the electron density first increases and then decreases with the external circuit capacitance increase, and the peak value is on 75 pF. In this study, we propose a method to further regulate the plasma parameter distribution by using terminal capacitance to control the induced magnetic field.