Rational Analysis of Self-Alignment Force of Reactive Additive Monomer with Multiple Methods

Abstract

Abstract Analysis self-alignment force (SAF) of reactive self-assambly additive monomer is highly valuable in self-alignment vertical alignment mode(SAVA), because this force directly influences performance of optoelectronics device. In this work, SAF has been studied by multiple methods, such as atomic force microscopy, mueller matrix imaging polarimeter. Reactive additive monomer and LC molecular were immobilized on the surface of an AFM probe and ITO, respectively. Due to the complexity of the additive monomer-hydroxy, additive monomer-LC moluclar interaction, parallel experiments were designed to discriminate specific interactions. The difference of pretilt angle between TFT side and CF side also reveals the difference of SAF at various structure cell.The additive with strong SAF showed well alignment state after forming into optoelectronice device.