Germanium nanoparticles formed in silicon dioxide layer by multi-energy implantation and oxidation state of Ge atoms
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/61/i=1/a=236/pdf
Reference13 articles.
1. Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers
2. Cluster coarsening and luminescence emission intensity of Ge nanoclusters in SiO2 layers
3. Slightly negative surface potential and charging model of insulator in the negative-ion implantation
4. Secondary electron emission and surface potential of SiO2 film surface by negative ion bombardment
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