Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit-Reference-Cited by-同舟云学术

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Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

Published:2016-08 Issue: Volume:741 Page:012193
ISSN:1742-6588
Container-title:Journal of Physics: Conference Series
language:
Short-container-title:J. Phys.: Conf. Ser.

Author:

Sidelev D V,Yuryeva A V,Krivobokov V P,Shabunin A S,Syrtanov M S,Koishybayeva Z

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

http://stacks.iop.org/1742-6596/741/i=1/a=012193/pdf

Reference13 articles.

1. Technological peculiarities of deposition anti-reflective layers in low-e coatings

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of seed layers on the reflectance of sputtered aluminum thin films;Optics Express;2021-06-08

2. Comparison of thermal properties of a hot target magnetron operated in DC and long HIPIMS modes;Surface and Coatings Technology;2021-03

3. Compact and flexible meander antenna for Surface Acoustic Wave sensors;Microelectronic Engineering;2020-04

4. Operation parameters of magnetron diode for high-rate deposition of aluminum films;Journal of Physics: Conference Series;2018-11

5. Investigation of a small-sized source parameters for magnetron sputtering with liquid-phase target;IOP Conference Series: Materials Science and Engineering;2018-07

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