E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating-Reference-Cited by-同舟云学术

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E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating

Published:2016-08 Issue: Volume:741 Page:012150
ISSN:1742-6588
Container-title:Journal of Physics: Conference Series
language:
Short-container-title:J. Phys.: Conf. Ser.

Author:

Fomchenkov S A,Butt M A,Podlipnov V V,Poletaev S D,Skidanov R V,Kazanskiy N L

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

http://stacks.iop.org/1742-6596/741/i=1/a=012150/pdf

Reference2 articles.

1. Color three-dimensional display with omnidirectional view based on a light-emitting diode projector

2. Broadband Antireflection Gratings for Glass Substrates Fabricated by Fast Atom Beam Etching

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2. Fabrication of amplitude-phase type diffractive optical elements in aluminium films;Journal of Physics: Conference Series;2017-11

3. FEATURES OF CHANGES IN THE NANOSTRUCTURE AND COLORIZING OF COPPER DURING SCANNING WITH A FEMTOSECOND LASER BEAM;Computer Optics;2017-01-01

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