Structural and morphological characteristics of GaN-based hybrid heterostructures grown on por-Si

Abstract

Abstract GaN/Si(111) heterostructures were grown by plasma-assisted molecular beam epitaxy on usual Si(111) substrates and compliant por-Si/Si(111) substrates without using AlN buffer layer. The positive influence of the high-temperature nitridation step, as well as the usage of a compliant substrate on crystalline quality, was confirmed. We got a crack-free 850-nm-thick GaN layer at room temperature by using the low-temperature GaN buffer layer with nanocolumnar morphology.