Investigation of plasma chamber erosion in an RF ion source

Abstract

Abstract Filament driven plasma sources are widely used to produce ion beams, but they require frequent maintenance due to the limited filament lifetime. External radio-frequency (RF) coupled ion source offers a filament-free plasma and hence better maintenance. However, one of the issues encountered during the development of a planar external RF-powered ion source at D-Pace was the erosion of its copper plasma chamber and subsequent formation of copper deposits on the Aluminum Nitride (AlN) RF window. The copper deposits on the RF window deteriorate the power coupling between the external antenna and the plasma. This paper investigates the erosion of the plasma chamber and describes some of the methods used to control the deposition of copper on the RF window.