Characterization of ZrO2and (ZrO2)x(Al2O3)1−Xthin films on Si substrates: effect of the Al2O3component
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/514/i=1/a=012011/pdf
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1. Dielectric properties of sol–gel derived high-k titanium silicate thin films
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3. Structure and thermal stability of (Zr0.6Al0.4)O1.8 thin film on strained SiGe layer
4. Deposition and Properties of the Pseudobinary Alloy (Al2O3)x(TiO2)1-xand Its Application for Silicon Surface Passivation
5. Structural and optical investigations of TiO2 films deposited on transparent substrates by sol–gel technique
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