Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/61/i=1/a=074/pdf
Reference10 articles.
1. Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
2. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
3. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
4. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
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