Wavelength dependence on the formation of SiO2 films by ultraviolet-laser-induced photochemical deposition using silicone rubber
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/59/i=1/a=092/pdf
Reference9 articles.
1. Photo-CVD Direct Patterning of Silicon Oxide Films by Optical Projection
2. A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp
3. Vacuum–ultraviolet pulsed-laser deposition of silicon dioxide thin films
4. Low-Temperature Formation of Thin-Gate SiO2Films by the Ultrahigh-Vacuum Chemical Vapor Deposition with Reduced Subcutaneous Oxidation Using Remote-Plasma-Activated Oxygen and Si2H6
5. SiO2 films fabricated by F2 laser-induced chemical deposition using silicone rubber
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