A plasma-chemical reactor of coupled vacuum-arc and ion-plasma processes for protective coatings formation based on titanium nitride

Abstract

Abstract A plasma-chemical reactor based on the principle of coupling of gas-discharge processes in a VU-1B vacuum installation has been developed. This plasma-chemical reactor combine vacuum-arc evaporation of titanium in a nitrogen-containing plasma and ion-plasma sputtering of copper with the formation of copper vapor. The basis of this method of coatings deposition is the principle of dosing the injection copper vapor into the region of TiN synthesis through a separating diaphragm with a variable metering aperture, which prevents penetration of a titanium vapor into the copper cathode of the magnetron. The synthesis of TiN coatings in copper vapors has been carried out with the formation of nanostructured composite TiN-Cu coatings.