Mechanical scanning probe lithography of nanophotonic devices based on multilayer TMDCs

Abstract

Abstract In this work, we demonstrate the possibility of using mechanical Scanning probe lithography (m-SPL) for fabricating nanophotonic devices based on multilayered transition metal dichalcogenides (TMDCs). By m-SPM, we created a nanophotonic resonator from a 70-nm thick MoSe2 flake transferred on Si/Au substrate. The optical properties of the created structure were investigated by measuring microphotoluminescence. The resonator exhibits four resonance PL peaks shifted in the long-wavelength area from the flake PL peak. Thus, here we demonstrate that m-SPL is a high-precision lithography method suitable for creating nanophotonic devices based on multilayered TMDCs.