Numerical simulation of pulsed planar evaporation into background gas based on direct Monte Carlo simulation and solution of the BGK model kinetic equation

Abstract

Abstract A numerical study of the planar gas expansion under pulsed evaporation into the background gas is carried out. The chosen conditions are typical for nanosecond laser deposition of thin films and nanostructure synthesis, with the saturated gas pressure at the surface of 5.4 MPa and the background pressure of 50 and 500 Pa. The problem is solved based on the direct simulation Monte Carlo method and direct numerical solution of the BGK model kinetic equation. A generally good agreement was obtained for all computed macroscopic quantities, with the exception of the higher density peak in the compressed layer and a wider shock front in the background gas for the BGK model.