Applicability of gas-jet MPCVD polycrystalline diamond films on silicon with NV centers in quantum magnetometry

Author:

Tarkov S M,Antonov V A,Podlesny S N,Yemelyanov A A,Rebrov A K,Popov V P,Volodin V A,Vdovin V I,Timoshenko N I,Yudin I B,Nadolinny V A

Abstract

Abstract Polycrystalline diamond film optical and electrical properties are investigated after the growth on <001> and <111> Si substrate by gas-jet MPCVD deposition in the presence of nitrogen in the gas mixture. Negatively charged NV center formation was observed at the ~1.0 ppm level with the substitutional nitrogen concentration of 70 ppm. A comparison with the IIa type monocrystalline diamond plates with implanted and annealed nitrogen atoms at the 90 ppm concentration shows three times higher NV center formation efficiency by gas-jet MPCVD deposition than by ion implantation. CW optically detected magnetic resonance (ODMR) demonstrates the NV contented polycrystalline film application in a quantum magnetometry.

Publisher

IOP Publishing

Subject

General Physics and Astronomy

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