Author:
Shchukin V G,Konstantinov V O,Sharafutdinov R G
Abstract
Abstract
The possibilities of plasma-chemical refining of metallurgical silicon have been demonstrated. It is shown that by electron-beam refining it is possible to reduce the concentration of phosphorus and boron, as well as the main metallic impurities by evaporation of both these impurities and their volatile compounds.
Subject
General Physics and Astronomy