Spectroscopy for identification of plasma sources for lithography and water window imaging-Reference-Cited by-同舟云学术

Spectroscopy for identification of plasma sources for lithography and water window imaging

Published:2015-09-07 Issue:1 Volume:635 Page:012026
ISSN:1742-6588
Container-title:Journal of Physics: Conference Series
language:
Short-container-title:J. Phys.: Conf. Ser.

Author:

O'Sullivan Gerry,Dunne Padraig,Higashiguchi Takeshi,Li Bowen,Liu Luning,Lokasani Ragava,Long Elaine,Ohashi Hayato,O'Reilly Fergal,Sheridan Paul,Sokell Emma,Suzuki Chihiro,Wu Tao

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

http://stacks.iop.org/1742-6596/635/i=1/a=012026/pdf

Reference19 articles.

1. Analyses of the Sn IX–Sn XII spectra in the EUV region

2. Optimization of Extreme Ultraviolet Emission from Laser-Produced Tin Plasmas Based on Radiation Hydrodynamics Simulations

3. Unresolved transition arrays

4. Efficient extreme ultraviolet emission from one-dimensional spherical plasmas produced by multiple lasers

5. High-resolution compact X-ray microscopy

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