Abstract
Abstract
We have tried the microfabrication of Bi2Sr2CaCu2O8+x (Bi2212) thin films. The thin films were prepared by the metal-organic decomposition method. The photoresist was printed on the thin films using a consumer-oriented inkjet printer. Filling a black cartridge with resist diluted 3 times with ethanol and printing with 80% black can minimize both the scattering of the resist and the areas where the resist is not on. After etching the thin films with citric acid, the photoresist was stripped with NaOH. Under the printing and etching conditions in this report, the resist width was about 0.05 mm wider than the desired width, and the undercut width was about 0.08 mm. We succeeded in forming a bridge of about 75 μm.
Subject
General Physics and Astronomy