Emission spectroscopy of Ar + H2+ C7H8plasmas: C7H8flow rate dependence and pressure dependence
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/518/i=1/a=012010/pdf
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1. Effect of tail time of discharge current on film properties in diamond-like carbon deposition by high-frequency inclusion high-power impulse magnetron sputtering;Diamond and Related Materials;2023-05
2. A Plasma Enhanced CVD Technology for Solving Issues on Sidewall Deposition in Trenches and Holes;2022 17th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT);2022-10-26
3. Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method;Japanese Journal of Applied Physics;2015-11-20
4. Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method;Transactions of the Materials Research Society of Japan;2015
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