Effect of Mg Doping Concentration on Structural, Morphology, and Optical Properties of Electrodeposited Cu2O Layer

Abstract

Abstract The present work shows the effect of magnesium doping on structural, morphology and optical properties of Cu2O layer prepared by electrodeposition method. The magnesium concentrations for doping on Cu2O layers were 0.1 ~ 0.3 M of Mg(OH)2. The structural, morphology, and optical properties of Cu2O layer were characterized by using Field Emission Scanning Electron (FESEM), Ultraviolet-Visible Spectroscopy (UV-Vis), and X-ray Diffractometry (XRD) respectively. The variation of magnesium concentration shows significant impact and effect on the Cu2O layer properties. The fabrication of doped Cu2O layers reached up to 0.3 M dopant concentration, resulting in morphology changes. The grain size increase within among dopant concentration, however it become smaller and compact after doped with 0.3 M. In structural properties, XRD results show the peaks assigned for (111) of Cu2O, (002) of CuO, and (200) of MgO, and the crystallite size for undoped until 0.2 M increased from 417.8 to 527.5 Å compatible with an observation by FESEM and optical absorption for 0.2 M.