Effect of aluminum shield on deposition parameters of Teflon irradiated by high energy electrons

Abstract

Abstract To study the influence of aluminum shield on deposition parameters of typical insulating medium Teflon irradiated by high energy electrons, a calculation model of aluminum shield and Teflon irradiated by high energy electrons was established. Monte Carlo method was used to simulate the effects of the energy of irradiated electrons, the thickness of aluminum shield and the electron irradiation current density on the distribution of parameters such as injection current density, charge deposition rate, radiation dose rate and radiation induced conductivity. The results show that the larger the energy of irradiated electrons, the stronger the ability of electrons to penetrate aluminum shield and Teflon. The higher the injection current density in Teflon is, the deeper the position of Bragg peak is, and the lower the height of the peak is. The thicker the aluminum shield, the shallower the peak position of charge deposition rate and electron radiation dose rate is, the smaller the absolute value of charge deposition rate peak is, and the lower the peak of radiation dose rate is.