Lithography alignment method based on image rotation matching

Abstract

Abstract In this paper, we propose a lithography alignment method based on digital image processing technology for the proximity-contact lithography system. We perform image processing such as edge detection and image segmentation on the input image to obtain the edge image of the alignment mark; then we use straight line detection to obtain the angle of the image and rotate the image; finally, we use the template of the alignment mark to perform image matching to obtain the position of the alignment mark. The algorithm is tested on a proximity-contact lithography machine. The results have proved that the algorithm can use any shape of pattern for lithography alignment and therefore is highly adaptable and has a wide range of applications.