Formation tantalum coating on NiTi surface by magnetron sputtering technique

Abstract

Abstract The materials of research the structure and morphology of the tantalum coating on the surface of the NiTi alloy in this work presents. Tantalum was deposited by the DC - magnetron sputtering method. The influence of the energy supplied to the magnetron on the formation of the Ta-coating is shown.Changes in the structure of the coating at different stages of its formation are shown.It was found that with a significant decrease in the energy supplied to the magnetron, tantalum is deposited more uniformly. Besides the gradient of mechanical stresses in the coating is reduced.