Anisotropy of glancing angle deposited films: results of atomistic simulation

Abstract

Abstract Anisotropy of SiO2 films fabricated by glancing angle deposition is investigated using the classical atomistic simulation and anisotropic Bruggeman effective medium theory. The voids between the slanted columns, occurring as a result of glancing angle deposition, are considered as ellipsoids. Averaged shape parameters of these ellipsoids are defined using the density gradient tensor. Calculated values of difference of refractive index components of glancing angle deposited SiO2 films are in accordance with experiment.