Is CF3I a good gaseous dielectric? A comparative swarm study of CF3I and SF6
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/86/i=1/a=012008/pdf
Reference22 articles.
1. Plasma etching of dielectric films using the non-global-warming gas CF3I
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