Research and Design of RF Ion Source Impedance Matching Network

Abstract

Abstract The radio frequency (RF) ion source is the key component of the neutral beam injector to achieve high power and long pulse operation. The key technology is feeding RF power from the power source to the ion source and producing stable plasma. It is impossible to calculate the exact equivalent impedance of plasma during discharge, and the impedance will change with the change in discharge pressure and feed power. In order to transfer the maximum output power of the RF power source to the coil antenna of the ion source, an impedance-matching network must be added between the power source and the ion source. Four possible matching network structures are designed by the Smith diagram circle method, and two kinds of capacitor structures are calculated and analyzed. The influence of capacitance change on impedance matching state is analyzed, and the electrical parameters of capacitance under the two structures are compared. After comparison and analysis, the structure of the parallel capacitor is first, and then the series capacitor is selected. Finally, the plasma discharge can be stable through experiments. The research on the matching network is of great significance for the development and experimental operation of the RF feeding system of the high-power RF ion source in the future