Magnetic microstructure of the Finemet-type thin films

Abstract

Abstract Fe73.9Cu1Nb3Si13.2B8.9 thin films were deposited on the glass substrates by means of ion-plasma radio frequency sputtering. Heat treatment at temperatures of 350, 400 and 450 °C was performed for 30 minutes in order to control thin film structural state. The X-ray powder diffraction showed that the crystallization of α-Fe(Si) nanograins took place at the temperature of 420 °C whilst the other samples stayed in the amorphous state. The magnetic microstructure of the Fe73.9Cu1Nb3Si13.2B8.9 films was discussed in the framework of random anisotropy model and law of approach of magnetization to saturation. The parameters of magnetic microstructure were determined, and relations between structure and macroscopic magnetic properties were interpreted by means of magnetic microstructure analysis.