Electrical properties of titanium nitride films synthesized by reactive magnetron sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/927/i=1/a=012036/pdf
Reference16 articles.
1. Titanium nitride as a plasmonic material for visible and near-infrared wavelengths
2. Hardness and elastic modulus of TiN based on continuous indentation technique and new correlation
3. Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering
4. Growth and properties of hard coatings prepared by physical vapor deposition methods
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