Influence of annealing temperatures on Nb2O5 nanostructures prepared using Pulsed Laser Deposition method

Abstract

Abstract Nb2O5 nanostructures were successfully deposited by a Pulsed Laser Deposition technique (PLD) onto quartz substrates. The effects of annealing temperature on the optical morphological and structural properties deposited nano-thin films were investigated. The X-ray diffraction (XRD) results indicated the formation of the monoclinic crystalline structure, with a preferential orientation at the (301) direction. The optical energy band gap found to increase from 2.9 to 3.3 eV.